Optics
|
Faiyaz
Mollick
,
Maheswar
Nayak
,
Ajay
Kumar Kashyap
,
Jitendra
Kumar
,
Arindam
Majhi
,
Nageswararao
Pothana
,
Parasmani
Rajput
,
Manoj
Kumar Tiwari
,
Sanjay
Kumar Rai
,
Manvendra
Narayan Singh
,
Archna
Sagdeo
Open Access
Abstract: The comprehensive structure, stress, and optical property correlation of high performance x-ray multilayer (ML) mirrors based on Mo/Si and W/B4C material systems is systematically investigated for hard x-ray applications in the 10–20 keV range. All MLs are deposited by magnetron sputtering with carefully tuned periodicities and number of layer pairs to optimize for either high photon flux or high spectral resolution. Structural properties are probed using x-ray reflectivity and diffuse scattering, while residual stress and crystallite characteristics of metallic layer are analyzed by grazing incidence x-ray diffraction. The Mo/Si MLs, with relatively large periods (∼6.53 and 9.43 nm), exhibit interlayer formation and demonstrate high reflectivity up to ∼92% along with very high integrated reflectivity, making them suitable for high-flux applications. In contrast, short and ultra-short period (∼3.74 and 1.85 nm) W/B4C MLs show sharp interfaces, supporting their use in high-resolution optics with relative energy resolution down to ∼1.2%.
|
Nov 2025
|
|
Metrology
Optics
|
Open Access
Abstract: A new Optics Metrology Laboratory for assembling and characterizing beamline x-ray optical systems has been built. This replaces the old laboratory, which was demolished to make space for construction of a new flagship beamline for the forthcoming Diamond-II facility upgrade. The new cleanroom laboratory is located between several beamlines and laboratories, which intermittently generate significantly higher levels of acoustic noise and floor vibrations. A threefold design strategy was employed to create an ultra-stable environment for the sensitive, optical metrology instruments. First, the walls, ceiling and doors of the laboratory were constructed to attenuate acoustic noise. Second, the air handling systems were designed to minimize self-production of noise and vibrations. Finally, engineering solutions were developed to further isolate the metrology instruments from environmental fluctuations. Overall, despite higher levels of external disturbances, this strategy enables nano-metrology to be successfully conducted in the new laboratory. The shielded environment around each instrument achieves noise rating NR30, which is 5–25 dB quieter than the old laboratory. Over 60-h, the temperature inside the Diamond-NOM’s enclosure varied by only 0.004 °C rms, and humidity changed by <1% RH. All optical metrology instruments are now performing better than in the old laboratory: the slope error repeatability of Diamond-NOM is improved from 15 to 9 nrad rms; the GTX micro-interferometer has measured super-polished substrates with micro-roughness <40 pm rms; the new gantry for Speckle Angular Measurement is commissioned; and the HDX Fizeau interferometer has measured mirrors with slope errors <50 nrad.
|
Oct 2025
|
|
B07-B1-Versatile Soft X-ray beamline: High Throughput ES1
B07-C-Versatile Soft X-ray beamline: Ambient Pressure XPS and NEXAFS
Optics
|
Wai Jue
Tan
,
Arindam
Majhi
,
Wadwan
Singhapong
,
Andrew C.
Walters
,
Matthijs A.
Van Spronsen
,
Georg
Held
,
Burcu
Karagoz
,
David C.
Grinter
,
Pilar
Ferrer
,
Guru
Venkat
,
Qiushi
Huang
,
Zhe
Zhang
,
Zhanshan
Wang
,
Patrick Yuheng
Wang
,
Andrey
Sokolov
,
Hongchang
Wang
,
Kawal
Sawhney
Open Access
Abstract: X-ray Photoelectron Spectroscopy (XPS) is a powerful tool for probing the chemical and electronic states of materials with elemental specificity and surface sensitivity. However, its application in the tender X-ray range (1–5 keV) for synchrotron radiation has remained limited due to the limited choice of optics capable of maintaining high reflectivity and efficiency in this energy window. To address this, multilayer (ML) grating structures have become increasingly popular, offering significantly higher efficiency than SL coatings in the tender X-ray region. This paper presents the development of ML laminar gratings optimised for enhancing efficiency in the tender X-ray range, and capable of retaining performance under intense X-ray exposure in the oxygen partial pressure of 10 mbar. The ML coating quality was verified through X-ray reflectivity (XRR), XPS and near-edge X-ray absorption fine structures (NEXAFS) measurements, while the performance of the grating was validated through beamline flux transmission and XPS measurements. The MLLG demonstrated 22 higher intensity in flux and XPS, significantly improving the signal-to-noise ratio. Most importantly, the MLLGs outperformed traditional designs by offering improved spectral resolution while maintaining measurement capability at varying values without compromising the intensity. Furthermore, we demonstrated that the incorporation of nitrogen during deposition further enhances flux transmission.
|
Oct 2025
|
|
Optics
|
Ilhan
Aziz
,
Younes
Chahid
,
Jennifer
Keogh
,
James
Carruthers
,
Katherine
Morris
,
Joel
Harman
,
Scott
Mcphee
,
Eilidh
Fraser
,
Luca
Millan
,
Cyril
Bourgenot
,
Paul
White
,
Spencer H.
Davies
,
Franck
Vidal
,
Wenjuan
Sun
,
Mirko
Sinico
,
Fraser
Laidlaw
,
Wai Jue
Tan
,
Arindam
Majhi
,
Carolyn
Atkins
Abstract: Additive manufacturing (AM; 3D Printing), a process which creates a part layer-by-layer, has the potential to improve upon conventional lightweight mirror manufacturing techniques, including subtractive (milling), formative (casting) and fabricative (bonding) manufacturing. Increased mass reduction whilst maintaining mechanical performance can be achieved through the creation of intricate lattice geometries, which are impossible to manufacture conventionally. Further, part consolidation can be introduced to reduce the number of interfaces and thereby points of failure. AM design optimisation using computational tools has been extensively covered in existing literature. However, additional research, specifically evaluation of the optical surface, is required to qualify these results before these advantages can be realised. This paper outlines the development and metrology of an AM mirror for a CubeSat platform with a targeted mass reduction of 60% compared to an equivalent solid body. This project aims to incorporate recent developments in AM mirror design, with a focus on manufacture, testing and evaluation. This is achieved through a simplified design process of a Cassegrain telescope primary mirror mounted within a 3U CubeSat chassis. The mirror geometry is annular with an external diameter of 84 mm and an internal diameter of 32 mm; the optical prescription is flat for ease of manufacture. Prototypes were printed in AlSi10Mg, a low-cost aluminium alloy commonly used in metal additive manufacturing. They were then machined and single-point diamond turned to achieve a reflective surface. Both quantitative and qualitative evaluations of the optical surface were conducted to assess the effect of hot isostatic pressing (HIP) on the optical surface quality. The results indicated that HIP reduced surface porosity; however, it also increased surface roughness and, consequently, optical scatter.
|
Sep 2025
|
|
Metrology
Optics
|
Simon G.
Alcock
,
Ioana-Theodora
Nistea
,
Murilo
Bazan Da Silva
,
Kawal
Sawhney
,
Norman
Niewrzella
,
Holger
Lasser
,
Amparo
Vivo
,
Ray
Barrett
,
Jana
Buchheim
,
Grzegorz
Gwalt
,
Frank
Siewert
,
Sibylle
Spielmann
,
Uwe
Flechsig
,
Silja
Schmidtchen
,
Maurizio
Vannoni
,
Josep
Nicolas
,
Muriel
Thomasset
,
Francois
Polack
Open Access
Abstract: The surface quality of x-ray mirrors is a major constraint on optical performance at synchrotron light and free electron laser facilities. A limiting factor for creating state-of-the-art optics is the accuracy of metrology data to deterministically guide the polishing tool to correct surface errors. The “MooNpics” (Metrology On One-Nanometer-Precise Optics) collaboration aims to improve optical metrology capabilities at European facilities to enable reproducible measurement of long or curved optics with height errors <1 nm rms and slope errors <100 nrad rms. Three challenging x-ray optics were measured by several labs using a variety of instruments. The mirrors, chosen to challenge and explore different aspects of optical metrology, were as follows: a 1 m-long, ultra-flat (radius of curvature R > 100 km); an ellipse with added parabolic arcs; and a strongly curved sphere (R ∼ 9.3 m) with an added spatially varying chirp. This study highlighted calibration issues with several instruments, which were subsequently corrected. In this paper, we present results about the ellipse mirror. Based on metrology data provided by the collaboration, two cycles of ion beam figuring improved all aspects of the mirror, including correcting the ellipse parameters, reducing high- and mid-frequency spatial polishing errors, and refining the shape of the parabolic arcs. Overall, the slope and height errors were improved by a factor of ∼10. We also show how the round-robin measurement exercise helped refine “best practice” procedures for mounting optics, alignment, and data acquisition and analysis methods. It is hoped that this collaborative project will ignite further improvements in the production quality of x-ray optics to benefit many scientific communities around the world.
|
Aug 2025
|
|
B16-Test Beamline
Optics
|
Open Access
Abstract: Multilayer (ML) monochromators are essential components in synchrotron radiation facilities, widely used for X-ray imaging and X-ray diffraction, as well as select X-ray spectroscopy techniques. However, ML monochromators introduce stripe artefacts to the reflected beam, which degrade the quality of the X-ray images. These stripe artefacts originate from figure errors on the monochromator’s surface, which are challenging to minimise for most manufacturers. In this study, we demonstrate stripe-free imaging from ultra-high-quality ML monochromators. We employed a state-of-the-art ion beam figuring (IBF) technique to produce multilayer substrates with a cutting-edge slope error of less than 30 nrad root mean squared (rms). These substrates were coated in an advanced multilayer deposition system, enabling the production of uniform multilayer coatings. The performance of the ML monochromators was tested at the B16 test beamline at the diamond light source. Speckle-based metrology was used to verify the theoretical link between wavefront curvature and the appearance of stripe artefacts. We obtained stripe-free X-ray images from the newly fabricated ML monochromators in both single-bounce and double-bounce configurations, with excellent image clarity and flat field uniformity. This represents a breakthrough in the production of ML monochromators.
|
Aug 2025
|
|
B16-Test Beamline
Optics
|
Wadwan
Singhapong
,
Arindam
Majhi
,
Wai Jue
Tan
,
Vishal
Dhamgaye
,
Riley
Shurvinton
,
Paresh
Pradhan
,
Igor
Dolbnya
,
Lucia
Alianelli
,
Chris
Bowen
,
Alexander J. G.
Lunt
,
Hongchang
Wang
,
Kawal
Sawhney
Open Access
Abstract: Multilayer monochromators are crucial optical elements for monochromatizing intense X-ray beams in applications demanding high photon flux with moderate energy resolution. Achieving high-performance multilayer monochromators requires optimizing multilayer parameters, using high-quality substrates, and precisely controlling the deposition process to ensure high reflectivity and eliminate stripe artifacts. This paper presents the design and development, and characterization of double multilayer monochromators (DMM). These coatings are deposited using an optimized mask design to ensure <0.3% sagittal thickness uniformity and employing reactive sputtering in nitrogen gas (N2) - to enhance multilayer reflectivity. A high reflectivity of 88.7% at 14.0 keV and 85.6% at 22.4 keV is achieved. Furthermore, stripe-free imaging is achieved in double-reflection geometry via the use of high-quality substrates produced using the in-house ion beam figuring machine. These findings offer valuable insights for developing high-performance DMMs, paving the way for the next generation of synchrotron optics and instruments.
|
Aug 2025
|
|
Optics
|
Open Access
Abstract: The plane grating monochromator (PGM) is an optical instrument used in the majority of soft X-ray beamlines. Despite its ubiquity, the PGM efficiency can easily be overestimated, because the geometry of many modern PGMs can lead to unexpected blocking of the beam. We have developed a new workflow in Python for simulating PGMs, thus extending the capabilities of SHADOW3, a well established ray tracing software tool. We have used our method to simulate the flux on branch C of the Versatile Soft X-ray (VerSoX) beamline B07 at Diamond Light Source. The simulation results demonstrate qualitative agreement with the experimental measurements, confirming the robustness of the proposed methodology.
|
Jul 2025
|
|
Optics
|
Open Access
Abstract: A study on the thermal load of cryogenically cooled silicon in synchrotron double-crystal monochromators is presented, based on experimental data from four different beamlines at Diamond Light Source. Different amounts of power are deposited on the first monochromator crystal by varying the storage ring current. The resulting crystal deformation causes a decline in the diffraction efficiency when power and power density are above threshold values. The results are compatible with an analytical model of thermo-mechanical deformation. Acceptable monochromator heat load values are determined with this model, to ensure optimal function of the monochromator. This model, previously tested against finite element analyses, is now validated against measured data and it will be used as a tool for initial analysis of monochromator performance on upgraded photon sources.
|
Jul 2025
|
|
Optics
|
Silja
Schmidtchen
,
Frank
Siewert
,
Ray
Barrett
,
Simon G.
Alcock
,
David
Dennetiere
,
Kai
Bagschik
,
Roberta
Totani
,
Ulrich
Wagner
,
Michael
Störmer
,
Analia
Fernandez Herrero
,
Dominique
Heinis
,
Louisa
Pickworth
Abstract: Contamination or damage to X-ray optics is becoming increasingly problematic for beamlines at 3rd and 4th generation storage-rings and FEL sources. Carbon contamination, induced by ultra-intense photon-beams, can cause a major loss in flux, focusing power, and specific absorptions which are detrimental to spectroscopy. For new light sources, with higher coherence, intensity, and repetition rates, contamination and accumulated damage will occur more rapidly. Replacing damaged optics is a time-consuming, risky, and expensive task. Production times are typically >6 months, and sometimes exceed 1 year. Costs per optic are typically tens of thousands of Euro, and can exceed 100k Euro. If several optics need to be replaced on a beamline, the overall cost can be hundreds of thousands of Euros. It is not sustainable or cost effective to replace optics on a yearly basis. Most facilities have independently investigated optical contamination over many years, but coordinated action is now required before the problem gets out of control. These issues motivate two-fold action: find practical methods to slow down the rate of contamination and damage; and develop protocols to safely remove contamination and return the optic to a pristine condition. High-quality metrology and surface science techniques are required to quantify the topography and chemical nature of the contamination, and assess the effectiveness of methods to reduce or remove it. To achieve these challenging goals requires a community effort. We propose an extensive collaboration, including experts from a range of scientific disciplines at various synchrotron and XFEL labs. X-ray optic community projects have recently delivered improvements in the quality X-ray mirrors via enhanced optical metrology. It is hoped that a concerted group effort will deliver similar major advancements, thereby helping to provide beamlines with cleaner, better-performing, X-ray optics.
|
Jun 2025
|
|