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Instruments / Technical Area	Publication Details	Published
B16-Test Beamline Metrology Optics	Speckle-based portable device for in-situ metrology of x-ray mirrors at Diamond Light Source Hongchang Wang , Tunhe Zhou , Yogesh Kashyap , Kawal Sawhney Null SPIE Optical Engineering + Applications, 2017 DOI: 10.1117/12.2274780 Diamond Proposal Number(s): [14242] Open Access Show Abstract ▼ Abstract: For modern synchrotron light sources, the push toward diffraction-limited and coherence-preserved beams demands accurate metrology on X-ray optics. Moreover, it is important to perform in-situ characterization and optimization of X-ray mirrors since their ultimate performance is critically dependent on the working conditions. Therefore, it is highly desirable to develop a portable metrology device, which can be easily implemented on a range of beamlines for in-situ metrology. An X-ray speckle-based portable device for in-situ metrology of synchrotron X-ray mirrors has been developed at Diamond Light Source. Ultra-high angular sensitivity is achieved by scanning the speckle generator in the X-ray beam. In addition to the compact setup and ease of implementation, a user-friendly graphical user interface has been developed to ensure that characterization and alignment of X-ray mirrors is simple and fast. The functionality and feasibility of this device is presented with representative examples.	Sep 2017
B16-Test Beamline Optics	Speckle-based at-wavelength metrology of x-ray optics at Diamond Light Source Hongchang Wang , Tunhe Zhou , Yogesh Kashyap , Kawal Sawhney Null Advances in Computational Methods for X-Ray Optics IV DOI: 10.1117/12.2274781 Open Access Show Abstract ▼ Abstract: To achieve high resolution and sensitivity on the nanometer scale, further development of X-ray optics is required. Although ex-situ metrology provides valuable information about X-ray optics, the ultimate performance of X-ray optics is critically dependent on the exact nature of the working conditions. Therefore, it is equally important to perform in-situ metrology at the optics’ operating wavelength (‘at-wavelength’ metrology) to optimize the performance of X-ray optics and correct and minimize the collective distortions of the upstream beamline optics, e.g. monochromator, windows, etc. Speckle-based technique has been implemented and further improved at Diamond Light Source. We have demonstrated that the angular sensitivity for measuring the slope error of an optical surface can reach an accuracy of two nanoradians. The recent development of the speckle-based at-wavelength metrology techniques will be presented. Representative examples of the applications of the speckle-based technique will also be given – including optimization of X-ray mirrors and characterization of compound refraction lenses. Such a high-precision metrology technique will be extremely beneficial for the manufacture and in-situ alignment/optimization of X-ray mirrors for next-generation synchrotron beamlines.	Aug 2017
I13-1-Coherence	X-ray Phase-Contrast Imaging and Metrology through Unified Modulated Pattern Analysis Marie-christine Zdora , Pierre Thibault , Tunhe Zhou , Frieder J. Koch , Jenny Romell , Simone Sala , Arndt Last , Christoph Rau , Irene Zanette Physical Review Letters 118 DOI: 10.1103/PhysRevLett.118.203903 Diamond Proposal Number(s): [14562] Open Access Show Abstract ▼ Abstract: We present a method for x-ray phase-contrast imaging and metrology applications based on the sample-induced modulation and subsequent computational demodulation of a random or periodic reference interference pattern. The proposed unified modulated pattern analysis (UMPA) technique is a versatile approach and allows tuning of signal sensitivity, spatial resolution, and scan time. We characterize the method and demonstrate its potential for high-sensitivity, quantitative phase imaging, and metrology to overcome the limitations of existing methods.	May 2017

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