Atmospheric pressure oxidation of Pt(111)

DOI: 10.1088/0953-8984/20/18/184013

Authors: C. Ellinger (Max-Planck-Institut für Metallforschung) , A. Stierle (Max-Planck-Institut für Metallforschung) , A. Nefedov (Ruhr-Universität Bochum) , H. Dosch (Max-Planck-Institut für Metallforschung) , I. K. Robinson (Diamond Light Source)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Journal Of Physics: Condensed Matter , VOL 20 , PAGES 184013

State: Published (Approved)
Published: May 2008

Abstract: The oxidation of the platinum (111) single crystal surface and the formation of platinum dioxide have been studied by in situ surface x-ray diffraction and x-ray reflectivity. At an oxygen partial pressure of 500 mbar and at temperatures from 520 to 910 K, the experiments disclose the growth of two atomic layers of a bulk-like, strongly distorted α-PtO2. The epitaxial Pt oxide layer is oriented hexagon on hexagon with respect to the Pt(111) surface leading to a (8 × 8) superstructure surface unit cell. In a second SET of experiments, a 100 Å thick epitaxial Pt(111) film on sapphire was exposed to oxygen. At 670 K and near atmospheric oxygen pressures we find the formation of a several angstrom thick oxide layer. After annealing the sample at 720 K in a vacuum the oxide layer desorbs, recovering the 100 Å thick Pt film. Subsequent oxidation at 720 K and reduction cycles lead to a slight increase in surface roughness and the formation of macroscopically visible holes in the Pt film. These results point to a Pt re-dispersion which sets in during chemical reactions at atmospheric pressures.

Subject Areas: Physics


Instruments: NONE-No attached Diamond beamline

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