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Laser crystallized low-loss polycrystalline silicon waveguides

DOI: 10.1364/OE.27.004462 DOI Help

Authors: Yohann Franz (University of Southampton) , Antoine F. J. Runge (University of Southampton; University of Sydney) , Swe Z. Oo (University of Southampton) , Gregorio Jimenez-martinez (University of Southampton) , Noel Healy (Newcastle University) , Ali Khokhar (University of Southampton) , Antulio Tarazona (University of Southampton) , Harold M. H. Chong (University of Southampton) , Sakellaris Mailis (University of Southampton) , Anna C. Peacock (University of Southampton)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Optics Express , VOL 27

State: Published (Approved)
Published: February 2019
Diamond Proposal Number(s): 13025

Open Access Open Access

Abstract: We report the fabrication of low-loss, low temperature deposited polysilicon waveguides via laser crystallization. The process involves pre-patterning amorphous silicon films to confine the thermal energy during the crystallization phase, which helps to control the grain growth and reduce the heat transfer to the surrounding media, making it compatible with CMOS integration. Micro-Raman spectroscopy, Secco etching and X-ray diffraction measurements reveal the high crystalline quality of the processed waveguides with the formation of millimeter long crystal grains. Optical losses as low as 5.3 dB/cm have been measured, indicating their suitability for the development of high-density integrated circuits.

Subject Areas: Physics


Instruments: I18-Microfocus Spectroscopy

Documents:
oe-27-4-4462.pdf