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Photonic micro-structures produced by selective etching of laser-crystallized amorphous silicon

DOI: 10.1364/OME.9.002573 DOI Help

Authors: G. Martinez-jimenez (University of Southampton) , Y. Franz (University of Southampton) , A. F. J. Runge (University of Southampton) , M. Ceschia (University of Southampton) , N. Healy (Newcastle University) , S. Z. Oo (University of Southampton) , A. Tarazona (University of Southampton) , H. M. H. Chong (University of Southampton) , A. C. Peacock (University of Southampton) , S. Mailis (University of Southampton)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Optical Materials Express , VOL 9

State: Published (Approved)
Published: May 2019
Diamond Proposal Number(s): 17304

Open Access Open Access

Abstract: We present a method for the production of polycrystalline Si (poly-Si) photonic micro-structures based on laser writing. The method consists of local laser-induced crystallization of amorphous silicon (a-Si) followed by selective etching in chemical agents that act preferentially on the a-Si material, consequently revealing the poly-Si content of the film. We have studied the characteristics of these structures as a function of the laser processing parameters and we demonstrate their potential photonic functionality by fabricating polycrystalline silicon ridge optical waveguides. Preliminary waveguide transmission performance results indicated an optical transmission loss of 9 dB/cm in these unrefined devices.

Subject Areas: Materials


Instruments: I18-Microfocus Spectroscopy

Documents:
m4jmj4.pdf