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1 m long multilayer-coated deformable piezoelectric bimorph mirror for adjustable focusing of high-energy X-rays

DOI: 10.1364/OE.27.016121 DOI Help

Authors: John P. Sutter (Diamond Light Source) , Philip A. Chater (Diamond Light Source) , Riccardo Signorato (CINEL Strumenti Scientifici s.r.l. via dell’Artigianato) , Dean S. Keeble (Diamond Light Source) , Michael R. Hillman (Diamond Light Source) , Matthew G. Tucker (Diamond Light Source) , Simon G. Alcock (Diamond Light Source) , Ioana Nistea (Diamond Light Source) , Heribert Wilhelm (Diamond Light Source)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Optics Express , VOL 27

State: Published (Approved)
Published: May 2019

Open Access Open Access

Abstract: The Diamond Light Source (DLS) beamline I15-1 measures atomic pair distribution functions (PDF) using scattering of 40-80 keV X-rays. A unique focusing element was needed to condense these X-rays from an initial large cross section (11.0 mm H × 4.2 mm V) into a required spot size of FWHM ≈680 μm (H) × 20 μm (V) at a variable position between the sample and the detector. The large numerical aperture is achieved by coating a silicon substrate over 1 m long with three multilayer stripes of Bragg angle 4.2 mrad. One stripe selects X-rays of each energy 40.0, 65.4, and 76.6 keV. Sixteen piezoelectric bimorph actuators attached to the sides of the mirror substrate adjusted the reflecting surface’s shape. Focal spots of vertical width < 15 µm were obtained at three positions over a 0.92 m range, with fast, easy switching from one focal position to another. Minimized root mean square slope errors were close to 0.5 µrad after subtraction of a uniform curvature. Reflectivity curves taken along each stripe showed consistent high peaks with generally small angular variation of peak positions. This is the first application of a 1 m long multilayer-coated bimorph mirror at a synchrotron beamline. Data collected with its help on a slice of a lithium ion battery’s cathode are presented.

Subject Areas: Technique Development, Physics


Technical Areas: Optics

Documents:
MLMirror_Sutter_OptExp_19.pdf