Publication

Article Metrics

Citations


Online attention

Desorption site-specificity and halogen minority sites on Si(111)

DOI: 10.1088/1367-2630/7/1/208 DOI Help

Authors: Jan Ingo Flege (University of Bremen) , Thomas Schmidt (Universität Bremen) , Jan Batjer (Hamburger Synchrotronstrahlungslabor HASYLAB/DESY) , Mehmet Cakmak (Gazi Üniversitesi) , Gerhard Materlik (Diamond Light Source) , Jens Falta (Universität Bremen)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: New Journal Of Physics , VOL 7 , PAGES 208

State: Published (Approved)
Published: October 2005

Abstract: We identify the SiCl3 bonding geometry as the most desorption-active site in x-ray photon-stimulated desorption (XPSD) of positive chlorine ions from chlorinated Si(1 1 1) surfaces due to their much higher desorption cross-section in comparison to the on-top majority site. The novel combination of x-ray standing waves (XSW), XPSD and density functional theory (DFT) allows to quantitatively determine this trichloride adsorption geometry with high spatial resolution and to deduce the site-specific desorption cross-sections for Cl+ and Cl2+ ions, respectively. Additionally, these SiCl3 groups are shown to exhibit a preferential crystallographic orientation which is confirmed by both XSW and DFT. Moreover, the analoguous identification of desorption-active SiBr3 species for Br/Si(1 1 1) suggests a common physical origin of the site-specific desorption cross-sections.

Journal Keywords: Condensed Matter: Electrical, Magnetic And Optical; Semiconductors; Adsorption; Chemical Bonds; Chlorine Ions; Cross Sections; Crystallography; Density Functional Method; Desorption; Geometry; Grain Orientation; Halogens; Photons; Silicon Chlorides

Subject Areas: Physics


Technical Areas:

Added On: 10/11/2010 08:51

Discipline Tags:



Technical Tags: