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Ultrathin Pt films on Ni(111): Structure determined by surface x-ray diffraction

DOI: 10.1103/PhysRevB.68.214416 DOI Help

Authors: O. Robach (ESRF, France) , H. Isern (ESRF, France) , P. Steadman (Diamond Light Source) , K. Peters (ESRF, France) , C. Quiros (ESRF, France) , S. Ferrer (ESRF, France)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Physical Review B , VOL 68 (21)

State: Published (Approved)
Published: December 2003

Abstract: The growth of platinum on a nickel ~111! single crystal under ultrahigh vacuum conditions was studied using surface x-ray diffraction on the ID03 beamline of the ESRF. Film thickness ranged from one to eight monoatomic layers ~ML!. Specular reflectivity was used to determine the growth mode and vertical lattice parameter of the Pt film. A two-dimensional ~2D! growth up to 1 ML followed by more 3D growth was found. A small expansion of the Pt vertical lattice parameter was found. The Pt in-plane lattice parameter was measured. Its relaxation was found to be very slow, with a residual contraction of 2.3% in an 8-ML-thick film ~with respect to bulk Pt!. A Ni crystal truncation rod measured before and after growing 1 ML of Pt revealed the presence of a small amount of pseudomorphic Pt, adsorbed on both fcc and hcp sites. The stacking of the ~111! Pt planes was investigated by measuring stacking-sensitive Pt diffraction rods. A strong tendency to stacking reversal was found at room temperature, with an amount of ‘ ‘reversed’’ Pt about ten times higher than the amount of Pt with the same stacking as the Ni. An eight-layer Ni film on Pt~111! was also studied for comparison

Subject Areas: Physics

Facility: ESRF