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Substrate dependent reduction of Gilbert damping in annealed Heusler alloy thin films grown on group IV semiconductors
Authors:
C. J.
Love
(University of York; Diamond Light Source)
,
B.
Kuerbanjiang
(University of York)
,
A.
Kerrigan
(University of York)
,
S.
Yamada
(Osaka University)
,
K.
Hamaya
(Osaka University)
,
G.
Van Der Laan
(Diamond Light Source)
,
V. K.
Lazarov
(University of York)
,
S. A.
Cavill
(University of York)
Co-authored by industrial partner:
No
Type:
Journal Paper
Journal:
Applied Physics Letters
, VOL 119
State:
Published (Approved)
Published:
October 2021

Abstract: A structural and FMR study is presented for epitaxial thin films of the Heusler alloy Co2FeAl0.5Si0.5 (CFAS) grown on Ge(111) and Si(111) substrates. All films, as-grown and post-annealed, show B2 ordering; full chemical order (L21) is not obtained over the range of anneal temperatures used in this study. As-grown films show a lower Gilbert damping constant, α, when grown on a Si(111) substrate compared to Ge(111). Annealing the films to 450 °C significantly reduces α for CFAS on Ge while increasing α for CFAS on Si. This is related to a substrate dependent competition between improvements in lattice structure and increased interfacial intermixing as a function of anneal temperature. The optimal annealing temperature to minimize α is found to differ by ∼100 K between the two substrates. Above an anneal temperature of 500 °C, films grown on both substrates have increased coercivity, decreased saturation magnetization, and show characteristic two-magnon scattering features.
Journal Keywords: Magnetic materials; Annealing; Thin films; Epitaxy; Semiconductors; Alloys; Spintronics; Magnetization dynamics
Diamond Keywords: Alloys; Spintronics; Ferromagnetism; Semiconductors
Subject Areas:
Materials,
Physics
Technical Areas:
Added On:
01/11/2021 09:20
Documents:
5.0060213.pdf
Discipline Tags:
Surfaces
Quantum Materials
Physics
Electronics
Magnetism
Materials Science
interfaces and thin films
Metallurgy
Technical Tags: