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At-wavelength metrology of an X-ray mirror using a downstream wavefront modulator

DOI: 10.1107/S1600577524002157 DOI Help

Authors: Tunhe Zhou (Stockholm University; Diamond Light Source) , Lingfei Hu (Diamond Light Source; University of Science and Technology of China) , Hongchang Wang (Diamond Light Source)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Journal Of Synchrotron Radiation , VOL 31

State: Published (Approved)
Published: May 2024
Diamond Proposal Number(s): 31201

Open Access Open Access

Abstract: At-wavelength metrology of X-ray optics plays a crucial role in evaluating the performance of optics under actual beamline operating conditions, enabling in situ diagnostics and optimization. Techniques utilizing a wavefront random modulator have gained increasing attention in recent years. However, accurately mapping the measured wavefront slope to a curved X-ray mirror surface when the modulator is downstream of the mirror has posed a challenge. To address this problem, an iterative method has been developed in this study. The results demonstrate a significant improvement compared with conventional approaches and agree with offline measurements obtained from optical metrology. We believe that the proposed method enhances the accuracy of at-wavelength metrology techniques, and empowers them to play a greater role in beamline operation and optics fabrication.

Journal Keywords: X-ray mirror; speckle; metrology

Subject Areas: Physics

Instruments: B16-Test Beamline

Added On: 09/04/2024 08:57


Discipline Tags:

Optics Physics Metrology

Technical Tags: