Operando characterization of electrochemistry at the rutile TiO2(110)/0.1 M HCl interface using ambient pressure XPS

DOI: 10.1021/acs.jpcc.4c07173

Authors: Jiangdong Yu (University College London,) , Conor Byrne (University of Manchester) , Jameel Imran (University College London) , Zoe Henderson (University of Manchester) , Katherine B. Holt (University College London) , Alexander I. Large (Diamond Light Source) , Georg Held (Diamond Light Source) , Alex Walton (University of Manchester) , Geoff Thornton (University College London)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: The Journal Of Physical Chemistry C

State: Published (Approved)
Published: November 2024
Diamond Proposal Number(s): 26045

Abstract: Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) was employed to investigate the effect of applied potential on the interface of TiO2(110) with 0.1 M HCl. The study, which involved operando electrochemical characterization, enabled real-time monitoring and analysis of electrochemical processes. There is a significant influence on the interface composition; in particular, the surface Cl– surface coverage varies with electrochemical potential. Moreover, there appears to be a reaction of evolved Cl with adventitious carbon to form C–Cl and C–Cl2 species.

Subject Areas: Chemistry, Materials, Physics


Instruments: B07-C-Versatile Soft X-ray beamline: Ambient Pressure XPS and NEXAFS

Added On: 02/12/2024 08:39

Documents:
yu-et-al-2024-operando-characterization-of-electrochemistry-at-the-rutile-tio2%28110%29-0-1-m-hcl-interface-using-ambient.pdf

Discipline Tags:

Surfaces Physics Physical Chemistry Chemistry Materials Science interfaces and thin films

Technical Tags:

Spectroscopy X-ray Photoelectron Spectroscopy (XPS) Near Ambient Pressure XPS (NAP-XPS)