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Characterization of trace embedded impurities in thin multilayer structures using synchrotron X-ray standing waves

DOI: 10.1002/sia.3178 DOI Help

Authors: Manoj Tiwari (Diamond Light Source) , Kawal Sawhney (Diamond Light Source) , G Lodha (Indus Synchrotron Utilization Division)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Surface And Interface Analysis , VOL 42 (2) , PAGES 110-116

State: Published (Approved)
Published: January 2010

Abstract: X-ray standing wave (XSW) field generated under Bragg reflection condition in a periodic Mo/Si multilayer structure has been used to determine the concentration and location of various trace element contaminants embedded in different layers of that multilayer structure. We have used intense synchrotron X rays for XSW analysis. It is observed that various trace element impurities such as Cr, Fe, Ni and W get embedded unintentionally in the multilayer structure during the deposition process. Consequences of such impurity incorporation on the optical properties of the multilayer structure are discussed in hard and soft X-ray regions. Present measurements are important in order to optimize the deposition methods on one hand and to better correlate the measured optical properties of a multilayer structure with theoretical models on the other.

Journal Keywords: X-Ray Multilayers; X-Ray Standing Wave; X-Ray Fluorescence; Atomic Impurities; Synchrotron Radiation

Subject Areas: Technique Development

Instruments: B16-Test Beamline