Aerosol Assisted Chemical Vapor Deposition of Transparent Conductive Zinc Oxide Films

DOI: 10.1021/cm302913b

Authors: Davinder Bhachu (University College London) , Gopinathan Sankar (University College London) , Ivan Parkin (University College London)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Chemistry Of Materials , VOL 24 (24) , PAGES 4704 - 4710

State: Published (Approved)
Published: December 2012
Diamond Proposal Number(s): 8374

Abstract: Highly conductive and transparent ZnO films were synthesized by the reaction of diethyl zinc (in toluene) with methanol by dual source aerosol assisted chemical vapor deposition. These films displayed a stable sheet resistance of 7.2 ?/? and high transmission across the visible region comparable to commercial transparent conducting oxides (TCOs) based on oxides of tin or indium. Doping the zinc oxide structure with fluorine (trifluorotoluene) resulted in dense compact films with improved electrical properties than ZnO films with a sheet resistance of 4.5 ?/?. These films also displayed idealized surface texturing for photovoltaic applications. Fluorine concentration was 2 at.% determined by wavelength dispersive X-ray analysis (WDX). Aluminum doped zinc oxide films were also synthesized by introducing dopant amounts of trimethylaluminium solution (in toluene) into the system. These films exhibited low sheet resistances of 14 ?/?. The aluminum concentration in the films was 4 at.% determined by WDX

Journal Keywords: Zinc Oxide; Transparent Conducting Oxide; Thin Films; Aacvd

Subject Areas: Chemistry, Materials


Instruments: I18-Microfocus Spectroscopy