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Development of high aspect ratio X-ray parabolic compound refractive lens at Indus-2 using X-ray lithography

DOI: 10.1007/s00542-013-2060-0 DOI Help

Authors: Vishal Dhamgaye (Raj Ramanna Centre for Advanced Technology) , M. K. Tiwari (Raj Ramanna Centre for Advanced Technology) , C. K. Garg (Raj Ramanna Centre for Advanced Technology) , P. Tiwari (Raj Ramanna Centre for Advanced Technology) , Kawal Sawhney (Diamond Light Source) , G. S. Lodha (Raj Ramanna Centre for Advanced Technology)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Microsystem Technologies

State: Published (Approved)
Published: January 2014

Abstract: A synchrotron beamline dedicated to soft and deep X-ray lithography is operational on Indus-2 synchrotron source and is being used for high aspect ratio microfabrication. This X-ray lithography facility provides the access to X-ray mask fabrication, X-ray exposures and development of micro-nano structures. We report the development of planar parabolic refractive X-ray lenses in SU-8 for energy range 8–20 keV using this facility. The focussing properties of X-ray lenses were studied with synchrotron radiation in the X-ray energy range 8–20 keV on the moderate emittance machine Indus-2. A focal spot of 11 μm at 15.9 keV is obtained with a gain of 18.

Subject Areas: Technique Development

Facility: Indus-2