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Defect-dependent colossal negative thermal expansion in UiO-66(Hf) metalorganic framework
DOI:
10.1039/C5CP01307K
Authors:
Matthew
Cliffe
(University of Oxford)
,
Joshua A
Hill
(University of Oxford)
,
Claire
Murray
(Diamond Light Source)
,
François-xavier
Coudert
(Chimie ParisTechCNRS)
,
Andrew
Goodwin
(University of Oxford)
Co-authored by industrial partner:
No
Type:
Journal Paper
Journal:
Physical Chemistry Chemical Physics
State:
Published (Approved)
Published:
April 2015
Diamond Proposal Number(s):
9940
Abstract: Thermallydensified hafnium terephthalate UiO-66(Hf) is shown to exhibit the strongest isotropic negative thermal expansion (NTE) effect yet reported for a metalorganic framework (MOF). Incorporation of correlated vacancy defects within the framework affects both the extent of thermal densification and the magnitude of NTE observed in the densified product. We thus demonstrate that defect inclusion can be used to tune systematically the physical behaviour of a MOF.
Subject Areas:
Chemistry,
Physics
Instruments:
I11-High Resolution Powder Diffraction