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Structural characterization of thin layered materials using x-ray standing wave enhanced elastic and inelastic scattering measurements

DOI: 10.1088/0953-8984/22/17/175003 DOI Help
PMID: 21393661 PMID Help

Authors: Manoj Tiwari (Diamond Light Source) , Kawal Sawhney (Diamond Light Source)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Journal Of Physics: Condensed Matter , VOL 22 (17) , PAGES 175003

State: Published (Approved)
Published: March 2010
Diamond Proposal Number(s): 501

Abstract: By measuring the intensities of the x-ray standing wave induced elastic and inelastic x-ray scattering from thin multilayer structures, we show that structural characterizations of the high and low z (atomic number) material layers can be performed independently. The method has been tested by analyzing the structural properties of an Nb/C/Nb trilayer and an Mo/Si periodic multilayer structure. The results of the x-ray scattering measurements have been compared with those obtained using x-ray reflectivity and conventional x-ray standing wave fluorescence techniques. It has been demonstrated that the present approach is especially suitable for studying multilayer structures comprising low atomic number layers, as it eliminates the requirement of a fluorescence signal, which is very weak in the case of low z materials.

Journal Keywords: Atomic Number; Carbon; Elastic Scattering; Fluorescence; Inelastic Scattering; Layers; Materials; Molybdenum; Niobium; Nondestructive Analysis; Periodicity; Physical Properties; Reflectivity; Signals; Silicon; Standing Waves; Thin Films; X Radiation; X-Ray Diffraction

Subject Areas: Materials, Technique Development


Instruments: B16-Test Beamline