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Direct Photoalignment and Optical Patterning of Molecular Thin Films

DOI: 10.1002/adma.201604382 DOI Help

Authors: Linus Pithan (Humboldt-Universität zu Berlin) , Paul Beyer (Humboldt-Universität zu Berlin) , Laura Bogula (Humboldt-Universität zu Berlin) , Anton Zykov (Humboldt-Universität zu Berlin) , Peter Schäfer (Humboldt-Universität zu Berlin) , Jonathan Rawle (Diamond Light Source) , Chris Nicklin (Diamond Light Source) , Andreas Opitz (Humboldt-Universität zu Berlin) , Stefan Kowarik (Humboldt-Universität zu Berlin)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Advanced Materials

State: Published (Approved)
Published: November 2016
Diamond Proposal Number(s): 12895

Abstract: A novel strategy for direct photoalignment of molecular materials using optothermal re-orientation is introduced. Photoalignment for molecular materials such as the organic semiconductor tetracene is shown, without relying on additional photoreactive dopants or alignment layers. Patterning and polarized light emission, e.g., for polarized organic light emitting diodes is demonstrated.

Journal Keywords: direct photolithographic patterning; excitonic absorption; molecular photoalignment; organic thin film growth; X-ray diffraction

Subject Areas: Materials, Physics


Instruments: I07-Surface & interface diffraction

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