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Nondestructive X-ray diffraction measurement of warpage in silicon dies embedded in integrated circuit packages

DOI: 10.1107/S1600576717003132 DOI Help

Authors: B. K. Tanner (Durham University) , A. N. Danilewsky (Albert-Ludwigs-Universit├Ąt) , R. K. Vijayaraghavan (Dublin City University) , A. Cowley (Dublin City University) , P. J. Mcnally (Dublin City University)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Journal Of Applied Crystallography , VOL 50

State: Published (Approved)
Published: April 2017
Diamond Proposal Number(s): 7983 , 8526 , 9471 , 12771

Open Access Open Access

Abstract: Transmission X-ray diffraction imaging in both monochromatic and white beam section mode has been used to measure quantitatively the displacement and warpage stress in encapsulated silicon devices. The displacement dependence with position on the die was found to agree well with that predicted from a simple model of warpage stress. For uQFN microcontrollers, glued only at the corners, the measured misorientation contours are consistent with those predicted using finite element analysis. The absolute displacement, measured along a line through the die centre, was comparable to that reported independently by high-resolution X-ray diffraction and optical interferometry of similar samples. It is demonstrated that the precision is greater than the spread of values found in randomly selected batches of commercial devices, making the techniques viable for industrial inspection purposes.

Journal Keywords: X-ray diffraction imaging; encapsulated silicon dies; warpage

Subject Areas: Materials, Physics


Instruments: B16-Test Beamline