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X-ray Phase-Contrast Imaging and Metrology through Unified Modulated Pattern Analysis

DOI: 10.1103/PhysRevLett.118.203903 DOI Help

Authors: Marie-christine Zdora (Diamond Light Source) , Pierre Thibault (University of Southampton) , Tunhe Zhou (Royal Institute of Technology) , Frieder J. Koch (Karlsruhe Institute of Technology) , Jenny Romell (Royal Institute of Technology) , Simone Sala (Diamond Light Source; University College London) , Arndt Last (Karlsruhe Institute of Technology) , Christoph Rau (Diamond Light Source; University of Manchester; Northwestern University) , Irene Zanette (Diamond Light Source)
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Physical Review Letters , VOL 118

State: Published (Approved)
Published: May 2017
Diamond Proposal Number(s): 14562

Open Access Open Access

Abstract: We present a method for x-ray phase-contrast imaging and metrology applications based on the sample-induced modulation and subsequent computational demodulation of a random or periodic reference interference pattern. The proposed unified modulated pattern analysis (UMPA) technique is a versatile approach and allows tuning of signal sensitivity, spatial resolution, and scan time. We characterize the method and demonstrate its potential for high-sensitivity, quantitative phase imaging, and metrology to overcome the limitations of existing methods.

Subject Areas: Physics, Technique Development

Instruments: I13-1-Coherence


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