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Speckle-based at-wavelength metrology of x-ray optics at Diamond Light Source

DOI: 10.1117/12.2274781 DOI Help

Authors: Hongchang Wang (Diamond Light Source) , Tunhe Zhou (Diamond Light Source) , Yogesh Kashyap (Diamond Light Source) , Kawal Sawhney (Diamond Light Source)
Co-authored by industrial partner: No

Type: Conference Paper
Conference: Advances in Computational Methods for X-Ray Optics IV
Peer Reviewed: No

State: Published (Approved)
Published: August 2017

Open Access Open Access

Abstract: To achieve high resolution and sensitivity on the nanometer scale, further development of X-ray optics is required. Although ex-situ metrology provides valuable information about X-ray optics, the ultimate performance of X-ray optics is critically dependent on the exact nature of the working conditions. Therefore, it is equally important to perform in-situ metrology at the optics’ operating wavelength (‘at-wavelength’ metrology) to optimize the performance of X-ray optics and correct and minimize the collective distortions of the upstream beamline optics, e.g. monochromator, windows, etc. Speckle-based technique has been implemented and further improved at Diamond Light Source. We have demonstrated that the angular sensitivity for measuring the slope error of an optical surface can reach an accuracy of two nanoradians. The recent development of the speckle-based at-wavelength metrology techniques will be presented. Representative examples of the applications of the speckle-based technique will also be given – including optimization of X-ray mirrors and characterization of compound refraction lenses. Such a high-precision metrology technique will be extremely beneficial for the manufacture and in-situ alignment/optimization of X-ray mirrors for next-generation synchrotron beamlines.

Journal Keywords: Metrology; at-wavelength; in-situ characterization; near- field speckle; synchrotron radiation

Subject Areas: Technique Development


Instruments: B16-Test Beamline