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Laser writing of polycrystalline Si ridge waveguides

DOI: 10.1109/CLEOE-EQEC.2017.8086657 DOI Help

Authors: G. Martinez-jimenez (University of Southampton) , Y. Franz (University of Southampton) , A. F. J. Runge (University of Southampton) , M. Ceschia (University of Southampton) , N. Heal (Newcastle University) , S. Z. Oo (University of Southampton) , A. Tarazona (University of Southampton) , H. M. H. Chong (University of Southampton) , A. C. Peacock (University of Southampton) , S. Mailis (University of Southampton)
Co-authored by industrial partner: No

Type: Conference Paper
Conference: Lasers and Electro-Optics Europe & European Quantum Electronics Conference, 2017
Peer Reviewed: No

State: Published (Approved)
Published: October 2017

Abstract: Polycrystalline silicon (poly-Si) has attracted significant interest in the area of silicon photonics because of its potential for combining good optical transmission, electronic functionality and low fabrication cost, which makes it an attractive material for commercial applications [1]. In addition, it was shown recently that by laser processing of amorphous Si (a-Si) it is possible to obtain very large grain poly-Si [2] resulting in a material with superior optical and electronic performance.

Journal Keywords: Optical waveguides; Waveguide lasers; Silicon; Chemical lasers; Optical device fabrication; Optical films; Substrates

Subject Areas: Materials


Instruments: I18-Microfocus Spectroscopy

Added On: 16/11/2017 15:39

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