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At-wavelength optics characterisation via X-ray speckle- and grating-based unified modulated pattern analysis

DOI: 10.1364/OE.26.004989 DOI Help

Authors: Marie-christine Zdora (Diamond Light Source) , Irene Zanette (Diamond Light Source) , Tunhe Zhou (Diamond Light Source) , Frieder J. Koch (Karlsruhe Institute of Technology) , Jenny Romell (Royal Institute of Technology) , Simone Sala (Diamond Light Source; University College London) , Arndt Last (Karlsruhe Institute of Technology) , Yasuo Ohishi (Japan Synchrotron Radiation Research Institute (JASRI)) , Naohisa Hirao (Japan Synchrotron Radiation Research Institute (JASRI)) , Christoph Rau (Diamond Light Source) , Pierre Thibault
Co-authored by industrial partner: No

Type: Journal Paper
Journal: Optics Express , VOL 26

State: Published (Approved)
Published: February 2018
Diamond Proposal Number(s): 14562

Open Access Open Access

Abstract: The current advances in new generation X-ray sources are calling for the development and improvement of high-performance optics. Techniques for high-sensitivity phase sensing and wavefront characterisation, preferably performed at-wavelength, are increasingly required for quality control, optimisation and development of such devices. We here show that the recently proposed unified modulated pattern analysis (UMPA) can be used for these purposes. We characterised two polymer X-ray refractive lenses and quantified the effect of beam damage and shape errors on their refractive properties. Measurements were performed with two different setups for UMPA and validated with conventional X-ray grating interferometry. Due to its adaptability to different setups, the ease of implementation and cost-effectiveness, we expect UMPA to find applications for high-throughput quantitative optics characterisation and wavefront sensing.

Subject Areas: Physics, Technique Development


Instruments: I13-1-Coherence

Documents:
oe-26-4-4989.pdf

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